Journal of Chemical and Pharmaceutical Research (ISSN : 0975-7384)

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Original Articles: 2014 Vol: 6 Issue: 1

Formaldehyde (CH2O) removal assisted by vapor and oxygen gas through pulse discharge method

Abstract

Though formaldehyde (CH2O) is the highly consumed organic chemical reactant in the world, its toxicity to human being has drawn much attention. CH2O removal is important for in-door air quality improvement. In this article, the CH2O removal dynamic process is simulated through pulse discharge method by establishing a zero dimensional model. Simulation indicates that the H2O vapor additive have achieved CH2O removal by generating OH and H radicals after electron collision, though H2O concentration ratio should be high for achieving effective removal. The mixing ratio increments of H2Ocan accelerate the generation of benign species of CO2 rather than CO through the reactions of OH with HCO radical and CO. The O2 additive is more efficient for achieving higher removal efficiency at lower mixing ratio than that H2O additive. When both H2O and O2 are co-mixed with CH2O, there appears reproduction of CH2O induced by the reaction between H2O molecule and HCO radical, which arises out the attenuation effect on the CH2O removal process.